Reactions of silicon cluster ions, Si
(n=10–65), with water
J. Chem. Phys. 94, 2631 (1991); doi:10.1063/1.459839
Issue Date: 15 February 1991
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The chemical reactions of size selected Si
(n=10–65) with D2O have been studied using injected ion drift tube techniques between temperatures of 258 and 404 K. The only products detected were a series of Sin(D2O)
adducts. Large variations in reactivity were observed for the smaller clusters (n<40) that diminish with increasing cluster size. Si
, Si
, Si
, Si
, and Si
are particularly unreactive compared to their neighbors. At room temperature the larger clusters (n>40) are a factor of ~10–1000 (depending on the bulk surface) less reactive towards water than bulk silicon. The reaction rates for all clusters exhibit an unusually strong negative temperature dependence but are independent of the buffer gas pressure. These results suggest that the reaction mechanism probably involves two steps. In the first step, a weakly bound molecularly adsorbed Si
···D2O adduct is produced. The second step involves rearrangement to give a more strongly bound (and probably dissociatively adsorbed) SinD2O+ product. It appears that the reaction rates for some of the smaller clusters show a faster than linear dependence on D2O pressure. One possible explanation for this unusual observation is that a second D2O molecule solvates the transition state and significantly lowers the activation barrier for dissociative adsorption.
The Journal of Chemical Physics is copyrighted by The American Institute of Physics.
| History: | Received 10 September 1990; accepted 16 November 1990 |
| Permalink: |
http://link.aip.org/link/?JCPSA6/94/2631/1 |
KEYWORDS and PACS
- 36.40.+d
Studies of special atoms and molecules Atomic and molecular clusters - 82.30.Fi
Physical chemistry Specific chemical reactions; reaction mechanisms Ion
molecule, ion
ion, and charge-transfer reactions
- 82.20.Hf
Physical chemistry Chemical kinetics Mechanisms and product distribution - YEAR: 1990-91
PUBLICATION DATA
0021-9606 (print)
1089-7690 (online)
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