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Exoelectron emission during oxidation of Cs films

J. Chem. Phys. 95, 3756 (1991); doi:10.1063/1.460826

Issue Date: 1 September 1991

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A. Böttcher, R. Grobecker, R. Imbeck, A. Morgante, and G. Ertl
Fritz-Haber-Institut der Max-Planck-Gesellschaft, Faradayweg 4-6, W-1000 Berlin 33, Germany
During oxidation of thin Cs films, a nonadiabatic surface reaction manifests itself in the emission of electrons. This effect was investigated in detail by combining measurements of the current and of energy distributions of these exoelectrons with studies on the electronic properties of the surface by means of ultraviolet photoelectron spectroscopy and metastable deexcitation spectroscopy. Exoelectron emission occurs via Auger deexcitation of the empty state derived from the O2 affinity level. This process is confined to the stage Cs2O2-->CsO2 in which resonance ionization of the affinity level of the impinging O2 molecule upon crossing the Fermi level EF is efficiently suppressed due to the absence of metallic states near EF. A kinetic model based on the successive steps involved in the oxidation of Cs is developed which describes qualitatively well all the experimental findings. The Journal of Chemical Physics is copyrighted by The American Institute of Physics.
History: Received 11 April 1991; accepted 14 May 1991
Permalink: http://link.aip.org/link/?JCPSA6/95/3756/1
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KEYWORDS and PACS

Keywords
PACS
  • 79.75.+g
    Electron and ion emission by liquids and solids; impact phenomena Exoelectron emission
  • 81.60.Bn
    Materials science Etching, corrosion, oxidation, and other surface treatments Metals and alloys
  • 82.65.Yh
    Physical chemistry Surface and interface chemistry Other surface and interface chemical processes
  • YEAR: 1990-91

PUBLICATION DATA

ISSN:
0021-9606 (print)   1089-7690 (online)
Publisher:
AIP is a member of CrossRef AIP

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