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MPSA effects on copper electrodeposition investigated by molecular dynamics simulations

J. Chem. Phys. 128, 044717 (2008); doi:10.1063/1.2824928

Published 31 January 2008

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Clint G. Guymon, John N. Harb, Richard L. Rowley, and Dean R. Wheeler
Department of Chemical Engineering, Brigham Young University, Provo, Utah 84602, USA
In superconformal filling of copper-chip interconnects, organic additives are used to fill high-aspect-ratio trenches or vias from the bottom up. In this study we report on the development of intermolecular potentials and use molecular dynamics simulations to provide insight into the molecular function of an organic additive (3-mercaptopropanesulfonic acid or MPSA) important in superconformal electrodeposition. We also investigate how the presence of sodium chloride affects the surface adsorption and surface action of MPSA as well as the charge distribution in the system. We find that NaCl addition decreases the adsorption strength of MPSA at a simulated copper surface and attenuates the copper-ion association with MPSA. The model also was used to simulate induced-charge effects and adsorption on a nonplanar electrode surface. ©2008 American Institute of Physics
History: Received 21 December 2006; accepted 16 November 2007; published 31 January 2008
Permalink: http://link.aip.org/link/?JCPSA6/128/044717/1
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KEYWORDS and PACS

Keywords
PACS
  • 81.15.Pq
    Electrodeposition, electroplating
  • 82.45.Qr
    Electrodeposition and electrodissolution
  • 68.43.Mn
    Adsorption kinetics
  • YEAR: 2008

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ISSN:
0021-9606 (print)   1089-7690 (online)
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