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Hard repulsive barrier in hot adatom motion during dissociative adsorption of oxygen on Ag(100)

J. Chem. Phys. 131, 174709 (2009); doi:10.1063/1.3258849

Published 6 November 2009

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Ming-Feng Hsieh,1 Deng-Sung Lin,1 Heiko Gawronski,2 and Karina Morgenstern2
1Institute of Physics, National Chiao Tung University, 1001 Ta-Hsueh Road, Hsinchu 30010, Taiwan and Department of Physics, National Tsing Hua University, 101 Kuang-Fu Road Section 2, Hsinchu 30013, Taiwan
2Division of Atomic and Molecular Structures (ATMOS), Institut for Solid State Physics, Leibniz University of Hannover, Appelstraße 2, D-30167 Hannover, Germany
Random pairing simulation and low temperature scanning tunneling microscopy (STM) are used to investigate the detailed O2 dissociative adsorption processes at 200 K for various coverages. The distribution of oxygen adatoms shows a strong repulsion between the adsorbates with a radius of ~0.8  nm. The comparison between STM results and simulation reveals two prominent pairing distances of 2 and 4 nm and their branching ratio is about 2:1. These findings shed new light on the origin of the large intrapair distances found and on the process behind the empirical “eight-site rule.” ©2009 American Institute of Physics
History: Received 18 June 2009; accepted 14 October 2009; published 6 November 2009
Permalink: http://link.aip.org/link/?JCPSA6/131/174709/1
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KEYWORDS and PACS

Keywords
PACS
  • 68.43.Mn
    Adsorption kinetics
  • 82.30.Lp
    Decomposition chemical reactions (pyrolysis, dissociation, and fragmentation)
  • YEAR: 2009

PUBLICATION DATA

ISSN:
0021-9606 (print)   1089-7690 (online)
Publisher:
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