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Stable toroidicity-induced Alfvén eigenmodes (TAEs) with low toroidal mode number (n=1 and n=2) were excited by application of alternating magnetic field perturbations generated with a set of e...
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Generation of polarized shear Alfvén waves by a rotating magnetic field source

Phys. Plasmas 16, 092106 (2009); doi:10.1063/1.3224030

Published 16 September 2009

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A. Gigliotti,1 W. Gekelman,1 P. Pribyl,1 S. Vincena,1 A. Karavaev,2 X. Shao,2 A. Surjalal Sharma,2 and D. Papadopoulos2
1Department of Physics and Astronomy, University of California, Los Angeles, California 90095-1696, USA
2Department of Physics and Astronomy, University of Maryland, College Park, Maryland 20742, USA
Experiments are performed in the Large Plasma Device at the University of California, Los Angeles to study the propagation of field-aligned, polarized kinetic shear Alfvén waves radiated from a rotating magnetic field source created via a novel phased orthogonal loop antenna. Both right and left hand circular polarizations are generated at a wide range of frequencies from 0.21<=omega/Omegaci<0.93. Propagation parallel to the background magnetic field near the Alfvén velocity is observed along with a small parallel wave magnetic field component implying a shear mode. The peak-to-peak magnitude of the wave magnetic field, 33 cm away from the antenna, is on the order of 0.8% of the background field and drops off in the far field. The full width at half maximum of the wave energy changes little over a distance of 2.5 parallel wavelengths while the exponential decrease in wave energy as a function of distance can be attributed to collisional damping. Evidence of electron heating and ionization is observed during the pulse. ©2009 American Institute of Physics
History: Received 16 April 2009; accepted 19 August 2009; published 16 September 2009
Permalink: http://link.aip.org/link/?PHPAEN/16/092106/1
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KEYWORDS and PACS

Keywords
PACS
  • 52.35.Bj
    Plasma magnetohydrodynamic waves
  • 52.50.-b
    Plasma production and heating
  • 52.55.-s
    Magnetic plasma confinement and equilibrium
  • 52.75.-d
    Plasma devices
  • YEAR: 2009

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PUBLICATION DATA

ISSN:
1070-664X (print)   1089-7674 (online)
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