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Characteristics of a velvet cathode under high repetition rate pulse operation

Phys. Plasmas 16, 103106 (2009); doi:10.1063/1.3254043

Published 30 October 2009

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Tao Xun, Jian-De Zhang, Han-Wu Yang, Zi-Cheng Zhang, and Yu-Wei Fan
College of Opto-electric Science and Engineering, National University of Defense Technology, Hunan 410073, China
As commonly used material for cold cathodes, velvet works well in single shot and low repetition rate (rep-rate) high-power microwave (HPM) sources. In order to determine the feasibility of velvet cathodes under high rep-rate operation, a series of experiments are carried out on a high-power diode, driven by a ~300  kV, ~6  ns, ~100  Omega, and 1–300 Hz rep-rate pulser, Torch 02. Characteristics of vacuum compatibility and cathode lifetime under different pulse rep-rate are focused on in this paper. Results of time-resolved pressure history, diode performance, shot-to-shot reproducibility, and velvet microstructure changes are presented. As the rep-rate increases, the equilibrium pressure grows hyperlinearly and the velvet lifetime decreases sharply. At 300 Hz, the pressure in the given diode exceeded 1 Pa, and the utility shots decreased to 2000 pulses for nonstop mode. While, until the velvet begins to degrade, the pulse-to-pulse instability of diode voltage and current is quite small, even under high rep-rate conditions. Possible reasons for the operation limits are discussed, and methods to improve the performance of a rep-rate velvet cathode are also suggested. These results may be of interest to the repetitive HPM systems with cold cathodes. ©2009 American Institute of Physics
History: Received 23 July 2009; accepted 1 October 2009; published 30 October 2009
Permalink: http://link.aip.org/link/?PHPAEN/16/103106/1
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1070-664X (print)   1089-7674 (online)
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REFERENCES (32)
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  1. G. A. Mesyats, S. D. Korovin, A. V. Gunin, V. P. Gubanov, A. S. Stepchenko, D. M. Grishin, V. F. Landl, and P. I. Alekseenko, Laser Part. Beams 21, 197 (2003).
  2. S. D. Korovin, E. A. Litvinov, G. A. Mesyats, V. V. Rostov, S. N. Rukin, V. G. Shpak, and M. I. Yalandin, IEEE Trans. Plasma Sci. 34, 1771 (2006).
  3. Ya. E. Krasik, A. Dunaevsky, A. Krokhmal, J. Felsteiner, A. V. Gunin, I. V. Pegel, and S. D. Korovin, J. Appl. Phys. 89, 2379 (2001).
  4. J. Benford, J. A. Swegle, and E. Schamilogulu, High Power Microwaves, 2nd ed. (Taylor & Francis Group, New York, 2007), Chap. 5.
  5. R. J. Barker and E. Schamiloglu, High-Power Microwave Sources and Technologies (The Institute of Electrical and Electronics Engineer, Inc., New York, 2001), Chap. 9.
  6. A. S. Gilmour, Jr., Microwave Tubes (Artech House, Norwood, 1986).
  7. Ya. E. Krasik, D. Yarmolich, J. Z. Gleizer, V. Vekselman, Y. Hadas, V. Tz. Gurovich, and J. Felsteiner, Phys. Plasmas 16, 057103 (2009).
  8. D. Shiffler, M. Haworth, K. Cartwright, R. Umstattd, M. Ruebush, S. Heidger, M. LaCour, K. Golby, D. Sullivan, P. Duselis, and J. Luginsland, IEEE Trans. Plasma Sci. 36, 718 (2008).
  9. R. B. Miller, J. Appl. Phys. 84, 3880 (1998).
  10. Ya. E. Krasik, J. Z. Gleizer, D. Yarmolich, A. Krokhmal, V. Ts. Gurovich, E. Efimov, J. Felsteiner, V. Bernshtam, and Yu. M. Saveliev, J. Appl. Phys. 98, 093308 (2005).
  11. Y. W. Fan, H. H. Zhong, Z. Q. Li, T. Shu, H. W. Yang, H. Zhou, C. W. Yuan, W. H. Zhou, and L. Luo, Phys. Plasmas 15, 083102 (2008).
  12. D. Shiffler, M. LaCour, K. Golby, M. Sena, M. Mitchell, M. Haworth, K. Hendricks, and T. Spencer, IEEE Trans. Plasma Sci. 29, 445 (2001).
  13. D. A. Shiffler, M. J. LaCour, M. Ruebush, K. Golby, D. Zagar, M. Haworth, T. Knowles, and R. Umstattd, Rev. Sci. Instrum. 73, 4358 (2002).
  14. D. A. Shiffler, J. Heggemeier, M. J. LaCour, K. Golby, and M. Ruebush, Phys. Plasmas 11, 1680 (2004).
  15. V. Vekselman, J. Glerzer, D. Yarmolich, J. Felsteiner, Ya. E. Krasik, L. Liu, and V. Bernshtam, Appl. Phys. Lett. 93, 081503 (2008).
  16. Y. W. Fan, H. H. Zhong, Z. Q. Li, H. W. Yang, T. Shu, H. Zhou, C. W. Yuan, J. Zhang, and L. Luo, J. Appl. Phys. 104, 023304 (2008).
  17. A. V. Gunin, V. F. Landl, S. D. Korovin, G. A. Mesyats, I. V. Pegel, and V. V. Rostov, IEEE Trans. Plasma Sci. 28, 537 (2000).
  18. A. Dunaevsky, Ya. E. Krasik, J. Felsteiner, and A. Sternlieb, J. Appl. Phys. 90, 3689 (2001).
  19. Ya. E. Krasik, A. Dunaevsky, and J. Felsteiner, Phys. Plasmas 8, 2466 (2001).
  20. Q. L. Liao, Y. Yang, L. S. Xia, J. J. Qi, Y. Zhang, Y. H. Huang, and Z. Qin, Phys. Plasmas 15, 114505 (2008).
  21. F. J. Agee, IEEE Trans. Plasma Sci. 26, 235 (1998).
  22. Y. W. Fan, H. H. Zhong, H. W. Yang, Z. Q. Li, T. Shu, J. Zhang, Y. Wang, and L. Luo, J. Appl. Phys. 103, 123301 (2008).
  23. Y. W. Fan, C. W. Yuan, H. H. Zhong, T. Shu, J. D. Zhang, H. W. Yang, J. H. Yang, Y. Wang, L. Luo, and Y. S. Zhao, IEEE Trans. Plasma Sci. 35, 1075 (2007).
  24. Y. W. Fan, H. H. Zhong, Z. Q. Li, T. Shu, J. D. Zhang, J. L. Liu, J. H. Yang, J. Zhang, C. W. Yuan, and L. Luo, Rev. Sci. Instrum. 79, 034703 (2008).
  25. V. P. Tarakanov, User's Manual for Code KARAT (Berkeley Research Associates, Berkeley, 1992).
  26. L. M. Li, L. Liu, L. Chang, H. Wan, J. C. Wen, and Y. G. Liu, Appl. Surf. Sci. 255, 4563 (2009).
  27. J. K. Shultis and R. E. Faw, Fundamentals of Nuclear Science and Engineering (Dekker, New York, 2002).
  28. G. A. Mesyats, Cathode Phenomena in a Vacuum Discharge: The Breakdown, the Spark and the Arc (Nauka, Moscow, 2000), Chap. 14.
  29. Y. M. Saveliev, W. Sibbett, and D. M. Parkes, J. Appl. Phys. 94, 5776 (2003).
  30. M. E. Cuneo, P. R. Menge, D. L. Hanson, W. E. Fowler, M. A. Bernard, G. R. Zisks, A. B. Filuk, T. D. Pointon, R. A. Vesey, D. R. Welch, J. E. Bailey, M. P. Desjarlais, T. R. Lockner, T. A. Mehlhorn, S. A. Slutz, and M. A. Stark, IEEE Trans. Plasma Sci. 25, 229 (1997).
  31. R. J. Umstattd, C. A. Schlise, and F. Wang, IEEE Trans. Plasma Sci. 33, 901 (2005).
  32. G. Melin, J. Vac. Sci. Technol. A 5, 2945 (1987).

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