Phys. Rev. B 73, 195306 (2006) [5 pages]
Mechanism for increasing dopant incorporation in semiconductors via doped nanostructures
Abstract
References (33)
Citing Articles
Igor L. Kuskovsky, 1,2 Y. Gu, 2 Y. Gong, 2 H. F. Yan, 2 J. Lau, 2,4 I. C. Noyan, 2 G. F. Neumark, 2 O. Maksimov, 3 X. Zhou, 3 M. C. Tamargo, 3 V. Volkov, 4 Y. Zhu, 4 and L. Wang51Department of Physics, Queens College of CUNY, Flushing, New York 11367, USA
2Department of Applied Physics and Applied Mathematics, Columbia University, New York, New York 10027, USA
3Department of Chemistry, City College of CUNY, New York, New York 10036, USA
4Materials Science Division, Brookhaven National Laboratory, Upton, New York 11973, USA
5Charles Evans & Associates, 810 Kifer, Sunnyvale, California 94086, USA
Received 22 February 2006; revised 6 April 2006; published 8 May 2006
A long-standing problem for ZnSe (and related alloys) has been to obtain good p-type doping. Recent work has given about an order-of-magnitude improvement in such doping by use of Te as a "codopant" to facilitate the introduction of an acceptor dopant (N), since it is known that p-ZnTe can be obtained quite readily; the Te was introduced in submonolayer quantities via planar ( ) doping during molecular beam epitaxy. Here, we examine the mechanism of this improved doping. We show that it resides in the formation of ZnTe-rich nanoislands, with the N embedded in these. This result is obtained by studies involving transmission electron microscopy, high-resolution x-ray diffraction, secondary-ion mass spectroscopy, and temperature quenching of photoluminescence. We note that these nanoislands appear quite unique, in providing doping of semiconductors, and thus are of great interest of their own.
©2006 The American Physical Society
REFERENCES (33)
For access to fully linked references, you need to log in.
For access to fully linked references, you need to Log in.
- G. F. Neumark, Phys. Rev. Lett. 62, 1800 (1989).
- G. F. Neumark, R. M. Park, and J. M. DePuydt, Phys. Today 47 (6), 26 (1994).
- C. G. Van de Walle, D. B. Laks, G. F. Neumark, and S. T. Pantelides, Phys. Rev. B 47, 9425 (1993).
- D. B. Laks, C. G. Van de Walle, G. F. Neumark, and S. T. Pantelides, Appl. Phys. Lett. 63, 1375 (1993).
- S. B. Zhang, S. H. Wei, and A. Zunger, Phys. Rev. Lett. 84, 1232 (1999).
- D. J. Chadi, Phys. Rev. B 59, 15181 (1999).
- W.-C. Lin, M. C. Tamargo, I. Kuskovsky, C. Tian, and G. F. Neumark, Appl. Phys. Lett. 76, 2205 (2000).
- S. P. Guo, W.-C. Lin, X. Zhou, M. C. Tamargo, C. Tian, I. Kuskovsky, and G. F. Neumark, J. Appl. Phys. 90, 1725 (2001).
- W. Lin, B. X. Yang, S. P. Guo, A. Elmouni, F. Fernandez, and M. C. Tamargo, Appl. Phys. Lett. 75, 2608 (1999).
- Igor L. Kuskovsky, G. F. Neumark, J. G. Tischler, and B. A. Weinstein, Phys. Rev. B 63, 161201(R) (2001).
- S. Gundel and W. Faschinger, Phys. Rev. B 65, 035208 (2002).
- Y. Gu, Igor L. Kuskovsky, M. van der Voort, G. F. Neumark, X. Zhou, and M. C. Tamargo, Phys. Rev. B 71, 045340 (2005).
- We note that the knowledge of hole concentration is essential for confirming the improved p-type doping. However, in practice, the Hall effect is difficult to measure, even in Van der Pauw geometry, in the absence of reliable Ohmic contacts [see e.g., P. M. Mensz et al., Appl. Phys. Lett. 63, 2800 (1993);
which are hard to fabricate in p-type ZnSe because of the surface Fermi level pinning [e.g., Y. Koide et al., J. Appl. Phys. 82, 2393 (1997)].
- C. G. Van de Walle, D. B. Laks, G. F. Neumark, and S. T. Pantelides, Phys. Rev. B 47, 9425 (1993).
- Igor L. Kuskovsky, C. Tian, C. Sudbrack, G. F. Neumark, W.-C. Lin, S. P. Guo, and M. C. Tamargo, J. Appl. Phys. 90, 2269 (2001).
- P. J. Dean, W. Stutius, G. F. Neumark, B. J. Fitzpatrick, and R. N. Bhargava, Phys. Rev. B 27, 2419 (1983).
- N. J. Duddles, K. A. Dhese, P. Devine, D. E. Ashenford, C. G. Scott, J. E. Nicholls, and J. E. Lunn, J. Appl. Phys. 76, 5214 (1994).
- H. D. Jung, C. D. Song, S. Q. Wang, K. Arai, Y. H. Wu, Z. Zhu, T. Yao, and H. Katayama-Yoshida, Appl. Phys. Lett. 70, 1143 (1997).
CITING ARTICLES
For access to citing articles, you need to log in.
For access to citing articles, you need to Log in.
|
A new free weekly publication from APS
|