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Apparatus to measure wafer curvature for multilayer systems in a vacuum furnace

Rev. Sci. Instrum. 73, 1821 (2002); doi:10.1063/1.1455132

Issue Date: April 2002

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A. B. Mann
Department of Materials Science and Engineering, The Johns Hopkins University, Baltimore, Maryland 21218
Manchester Materials Science Centre, University of Manchester and UMIST, Grosvenor Street, Manchester M1 7HS, United Kingdom

J. Tapson
Department of Electrical Engineering, University of Cape Town, Rondebosch, South Africa

D. van Heerden and A. C. Lewis
Department of Materials Science and Engineering, The Johns Hopkins University, Baltimore, Maryland 21218

D. Josell
Metallurgy Division, National Institute of Standards and Technology, Gaithersburg, Maryland 20899

T. P. Weihs
Department of Materials Science and Engineering, The Johns Hopkins University, Baltimore, Maryland 21218
A laser-based technique for measuring the curvature of a multilayer/substrate couple is described. Unlike most wafer curvature systems, the instrument described measures the local curvature of the multilayer/substrate couple, correcting for the local topography of the substrate, rather than measuring changes in the average curvature of the multilayer/substrate couple. The apparatus has been designed specifically to perform biaxial zero-creep measurements at elevated temperatures in vacuum. It can also be used to examine the development of biaxial stresses during thermal cycling of thin films deposited on substrates. ©2002 American Institute of Physics.
History: Received 2 July 2001; accepted 7 January 2002
Permalink: http://link.aip.org/link/?RSINAK/73/1821/1
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KEYWORDS and PACS

Keywords
PACS
  • 06.30.Bp
    Metrology, measurements, and laboratory procedures Measurements common to several branches of physics and astronomy Spatial dimensions (e.g., position, lengths, volume, angles, and displacements)
  • 68.65.Ac
    Surfaces and interfaces; thin films and low-dimensional systems (structure and nonelectronic properties) Low-dimensional, mesoscopic, and nanoscale systems: structure and nonelectronic properties Multilayers
  • YEAR: 2002

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PUBLICATION DATA

ISSN:
0034-6748 (print)   1089-7623 (online)
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REFERENCES (15)
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  12. Names of manufacturers or equipment included in this work are stated for completeness only and do not imply an endorsement by NIST.
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