Microstitching interferometry for x-ray reflective optics
Rev. Sci. Instrum. 74, 2894 (2003); doi:10.1063/1.1569405
Issue Date: May 2003
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A new stitching interferometry based on a microscopic interferometer having peak-to-valley height accuracy of subnanometer order and lateral resolution higher than 20 µm was developed to measure surface figures of large-size x-ray mirror optics. Cumulative errors of the stitching angle in a long spatial wavelength range were effectively reduced to be 1×107 rad levels using another interferometer having a large cross section in the optical cavity. Some optical performances of ultraprecise x-ray mirrors, such as submicrofocused beam profile, were wave optically calculated from the measured surface figure profiles and observed at the 1 km long beamline (BL29XUL) of SPring-8. Observed and wave optically calculated results were in good agreement with a high degree of accuracy. ©2003 American Institute of Physics.
| History: | Received 12 December 2002; accepted 5 February 2003 |
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