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Plasma sputtering system for deposition of thin film combinatorial libraries

Rev. Sci. Instrum. 76, 062221 (2005); doi:10.1063/1.1921552

Published 26 May 2005

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James S. Cooper, Guanghai Zhang, and Paul J. McGinn
Department of Chemical and Biomolecular Engineering and Center for Molecularly Engineered Materials, University of Notre Dame, Notre Dame, Indiana 46556
The design of a plasma sputtering system for the deposition of combinatorial libraries is described. A rotating carousel is used to position shadow masks between the targets and the substrate. Multilayer films are built up by depositing sequentially through various masks. Postdeposition annealing is used to promote interdiffusion of the layered structures. Either discrete or compositional gradient libraries can be deposited in this system. Samples appropriate for characterization with a scanning electrochemical microscope or a multichannel microelectrode array system can be produced. The properties of some deposited Pt–Ru films for fuel cell applications are described. ©2005 American Institute of Physics
History: Received 26 October 2004; accepted 3 April 2005; published 26 May 2005
Permalink: http://link.aip.org/link/?RSINAK/76/062221/1
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KEYWORDS and PACS

Keywords
PACS
  • 81.15.Cd
    Deposition by sputtering
  • 81.40.Gh
    Other heat and thermomechanical treatments
  • 66.30.Ny
    Chemical interdiffusion in solids including diffusion barriers
  • 68.55.Ac
    Thin film nucleation and growth: microscopic aspects
  • YEAR: 2005

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PUBLICATION DATA

ISSN:
0034-6748 (print)   1089-7623 (online)
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