Getter sputtering system for high-throughput fabrication of composition spreads
Rev. Sci. Instrum. 78, 072212 (2007); doi:10.1063/1.2755967
Published 13 July 2007
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We describe a sputtering system that can deposit composition spreads in an effectively UHV environment but which does not require the high-throughput paradigm to be compromised by a long pump down each time a target is changed. The system deploys four magnetron sputter guns in a cryoshroud (getter sputtering) which allows elements such as Ti and Zr to be deposited with minimal contamination by oxygen or other reactive background gases. The system also relies on custom substrate heaters to give rapid heating and cool down. The effectiveness of the gettering technique is evaluated, and example results obtained for catalytic activity of a pseudoternary composition spread are presented.
©2007 American Institute of Physics
| History: | Received 3 November 2006; accepted 13 February 2007; published 13 July 2007 |
| Permalink: |
http://link.aip.org/link/?RSINAK/78/072212/1 |
Supplemental Material
- AdditionalNotes.doc (3049 kB) 18-Jun-2007 12:37
- DesignDetails.ppt (107 kB) 18-Jun-2007 12:37
- HeaterBoxCAD.dwg (191 kB) 18-Jun-2007 12:37
- ManufacturingInstructions.doc (89 kB) 18-Jun-2007 12:37
- README.TXT (0 kB) 16-Jul-2007 12:43
KEYWORDS and PACS
RELATED DATABASES
PUBLICATION DATA
0034-6748 (print)
1089-7623 (online)
REFERENCES (17)
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