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Quartz crystal microbalance-based system for high-sensitivity differential sputter yield measurements

Rev. Sci. Instrum. 80, 103506 (2009); doi:10.1063/1.3249560

Published 26 October 2009

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B. Rubin, J. L. Topper, C. C. Farnell, and A. P. Yalin
Mechanical Engineering, Colorado State University, Fort Collins, Colorado 80523, USA
We present a quartz crystal microbalance-based system for high sensitivity differential sputter yield measurements of different target materials due to ion bombardment. The differential sputter yields can be integrated to find total yields. Possible ion beam conditions include ion energies in the range of 30–350 eV and incidence angles of 0°–70° from normal. A four-grid ion optics system is used to achieve a collimated ion beam at low energy (<100  eV) and a two-grid ion optics is used for higher energies (up to 750 eV). A complementary weight loss approach is also used to measure total sputter yields. Validation experiments are presented that confirm high sensitivity and accuracy of sputter yield measurements. ©2009 American Institute of Physics
History: Received 22 May 2009; accepted 24 September 2009; published 26 October 2009
Permalink: http://link.aip.org/link/?RSINAK/80/103506/1
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KEYWORDS and PACS

Keywords
PACS
  • 07.10.Lw
    Balance systems, tensile machines, etc.
  • 41.85.Si
    Particle beam collimators, monochromators
  • 68.49.Sf
    Ion scattering from surfaces
  • 79.20.Rf
    Atomic, molecular and ion beam impact and interactions with surfaces
  • 06.30.Dr
    Mass and density measurement
  • YEAR: 2009

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PUBLICATION DATA

ISSN:
0034-6748 (print)   1089-7623 (online)
Publisher:
AIP is a member of CrossRef AIP

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