High frequency dielectric properties distribution of BiFeO3 thin film using near-field microwave microscopy
Rev. Sci. Instrum. 80, 114701 (2009); doi:10.1063/1.3258201
Published 5 November 2009
You are not logged in to this journal. Log in
A near-field scanning microwave microscopy (NSMM) is applied to investigate the local perpendicular dielectric information of single-phase multiferroic BiFeO3 thin film and single crystal LaAlO3 material. Our NSMM is composed of a vector network analyzer and a simple open-ended coaxial probe, which is quite different from the commercial probe with a
/4 coaxial resonator. The local permittivity is calculated quantitatively according to resonance frequency shift under the quasistatic microwave perturbation theory. We make use of the magnitude of reflection loss S11 to construct an image reflecting the distribution of dielectric constant of a material. A homogeneous permittivity is observed in LaAlO3 material and the inhomogeneous permittivity
=215–250 for BiFeO3 film is depicted from the change of feedback signal S11 over an area of 100×100 µm2.
©2009 American Institute of Physics
/4 coaxial resonator. The local permittivity is calculated quantitatively according to resonance frequency shift under the quasistatic microwave perturbation theory. We make use of the magnitude of reflection loss S11 to construct an image reflecting the distribution of dielectric constant of a material. A homogeneous permittivity is observed in LaAlO3 material and the inhomogeneous permittivity
=215–250 for BiFeO3 film is depicted from the change of feedback signal S11 over an area of 100×100 µm2.
©2009 American Institute of Physics
| History: | Received 14 September 2009; accepted 13 October 2009; published 5 November 2009 |
| Permalink: |
http://link.aip.org/link/?RSINAK/80/114701/1 |
KEYWORDS and PACS
RELATED DATABASES
PUBLICATION DATA
0034-6748 (print)
1089-7623 (online)
REFERENCES (13)
For access to fully linked references, you need to log in.
For access to fully linked references, you need to Log in.
- B. T. Rosner and D. W. van der Weide, Rev. Sci. Instrum. 73, 2505 (2002).
- C. Gao and X. -D. Xiang, Rev. Sci. Instrum. 69, 3846 (1998).
- Y. Chen, J. Gao, J. Lou, M. Liu, S. D. Yoon, A. L. Geiler, M. Nedoroscik, D. Heiman, N. X. Sun, C. Vittoria, and V. G. Harris, J. Appl. Phys. 105, 07A510 (2009).
- D. E. Steinhauer, C. P. Vlahacos, F. C. Wellstood, S. M. Anlage, C. Canedy, R. Ramesh, A. Stanishevsky, and J. Melngailis, Appl. Phys. Lett. 75, 3180 (1999).
- A. Imtiaz, T. Baldwin, H. T. Nembach, T. M. Wallis, and P. Kabos, Appl. Phys. Lett. 90, 243105 (2007).
- Z. Wang, M. A. Kelly, Z. X. Shen, L. Shao, W. K. Chu, and H. Edwards, Appl. Phys. Lett. 86, 153118 (2005).
- A. Tselev, S. M. Anlage, Z. Ma, and J. Melngailis, Rev. Sci. Instrum. 78, 044701 (2007).
- X. Y. Zhang, Q. Song, F. Xu, and C. K. Ong, Appl. Phys. Lett. 94, 022907 (2009).
- X. Y. Zhang, P. Wang, S. Sheng, F. Xu, and C. K. Ong, J. Appl. Phys. 104, 124110 (2008).
- A. Imtiaz and S. M. Anlage, J. Appl. Phys. 100, 044304 (2006).
- V. V. Talanov, A. Scherz, R. L. Moreland, and A. R. Schwartz, Appl. Phys. Lett. 88, 134106 (2006).
- H. F. S. S. Ansoft, 11, User Documentation (Ansoft Corporation, 2007).
- D. M. Pozar, Microwave Engineering (Addison-Wesley, New York, 1990).







