Fabrication of concave silicon micro-mirrors

We have fabricated spherical and cylindrical concave micro-mirrors in silicon with dimensions from 20 µm to 100 µm. The fabrication process involves standard photolithography followed by large area ion beam irradiation and electrochemical anodisation in a HF electrolyte. After thermal oxidation the silicon surface roughness is less than 2 nm. We also present a multilayer porous silicon distributed Bragg reflector fabricated on concave silicon surfaces which selectively reflect and focus a band of wavelengths from a parallel beam of incident white light. Development of such low roughness concave microstructures opens up new applications in areas such as silicon photonics and quantum information science. ©2010 Optical Society of America

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