Home | About Journal | Web Links | E-mail Alerts | RSS RSS Icon | Browse
Previous Article Next Article

Laser ablation characteristics of yttria-doped zirconia in the nanosecond and femtosecond regimes

Source: J. Appl. Phys. 107, 014908 (2010); doi:10.1063/1.3275868

Published 8 January 2010

KEYWORDS and PACS
Keywords
PACS
  • 81.15.Fg
    Laser deposition
  • 81.40.Gh
    Other heat and thermomechanical treatments
  • 68.55.at
    Thin film nucleation and growth in other materials
  • 78.30.Hv
    Infrared and Raman spectra in nonmetallic inorganics
  • 62.20.mm
    Fracture in solids
  • 62.20.mt
    Cracks in solids
  • 81.40.Np
    Fatigue, embrittlement, fracture and failure
  • 68.35.Gy
    Mechanical properties and surface strains of solid surfaces and interfaces
  • 62.20.mj
    Brittleness of solids
  • 78.47.D-
    Time resolved spectroscopy (>1 psec)
  • 78.66.Nk
    Optical properties of insulators (thin films)
  • YEAR: 2010
RELATED DATABASES

To view database links for this article,
you need to log in.
To view database links for this article,
you need to log in.
PUBLICATION DATA
ISSN:
1553-9601 (online)
Publisher:
AIP is a member of CrossRef AIP
S. Heiroth,1 J. Koch,2 T. Lippert,1 A. Wokaun,1 D. Günther,2 F. Garrelie,3 and M. Guillermin3
1Department of General Energy Research, Paul Scherrer Institut, 5232 Villigen-PSI, Switzerland
2Laboratory of Inorganic Chemistry, ETH Zurich, Wolfgang-Pauli-Strasse 10, 8093 Zurich, Switzerland
3Laboratoire Hubert Curien (UMR 5516 CNRS), Université Jean Monnet, 18 Rue Pr B. Lauras, 42000 Saint Etienne, France
The laser ablation characteristics of yttria-stabilized zirconia (YSZ) have been investigated as a function of the target microstructure and dopant level for different nanosecond- [ArF, KrF, and XeCl excimers; Nd:YAG (yttrium aluminum garnet) (fourth harmonic)] and femtosecond-laser sources [Ti:sapphire (fundamental and third harmonic)]. Particle ejection, which compromises the quality of coatings prepared by pulsed laser deposition (PLD), was analyzed in detail. Nanosecond-laser pulses cause a severe thermomechanical surface cracking and exfoliation of micron-sized fragments on a microsecond to millisecond time scale in the case of 8–9.5  mol % Y2O3-doped, fully stabilized zirconia (8YSZ and 9.5YSZ) targets. As a consequence of the intrinsic material brittleness, fully stabilized YSZ coatings deposited by PLD contained particles for all tested conditions. Lower doped partially stabilized zirconia (3YSZ) exhibits a superior fracture toughness attributed to a laser-induced partial transition to the monoclinic phase, detected by Raman spectroscopy, which enables the deposition of particle-free dense thin films by conventional PLD using nanosecond-UV laser radiation at moderate fluences of 1.2–1.5  J/cm2. The ablation dynamics of ultrashort laser pulses differ fundamentally from the nanosecond regime as evidenced, e.g., by time-resolved shadowgraphy and light scattering experiments. Femtosecond pulses prevent the exfoliation of micron-sized fragments but result invariably in a pronounced ejection of submicron particles. The resulting PLD coatings are porous and reveal a large surface roughness as they consist of an agglomeration of nanoparticles. Femtosecond-NIR pulses provide a factor of 2.5–10 higher material removal rates compared to nanosecond- and femtosecond-UV pulses. The ablation metrics, i.e., threshold fluence and effective absorptivity, mainly depend on the laser wavelength while the pulse duration, target microstructure, and dopant level are of minor importance. Evidence is presented that incubation effects play a significant role in nanosecond- and femtosecond-laser ablations of YSZ enabling material removal at comparatively low fluences for sub-bandgap photon energies. ©2010 American Institute of Physics
History: Received 4 August 2009; accepted 22 November 2009; published 8 January 2010
Permalink: http://link.aip.org/link/?JAPIAU/107/014908/1

REFERENCES (51)

For access to fully linked references, you need to log in. For access to fully linked references, you need to Log in.
  1. H. G. Scott, J. Mater. Sci. 10, 1527 (1975).
  2. R. Stevens, Zirconia and Zirconia Ceramics, 2nd ed. (Magnesium Elektron Ltd., Leeds, UK, 1986).
  3. D. D. Hass, A. J. Slifka, and H. N. G. Wadley, Acta Mater. 49, 973 (2001).
  4. A. A. Voevodin, J. J. Hu, T. A. Fitz, and J. S. Zabinski, Surf. Coat. Technol. 146–147, 351 (2001).
  5. A. P. Caricato, A. Di Cristoforo, M. Fernandez, G. Leggieri, A. Luches, G. Majni, M. Martino, and P. Mengucci, Appl. Surf. Sci. 208–209, 615 (2003).
  6. P. Mengucci, G. Barucca, A. P. Caricato, A. Di Cristoforo, G. Leggieri, A. Luches, and G. Majnia, Thin Solid Films 478, 125 (2005).
  7. J. Zhu, T. L. Li, B. Pan, L. Zhou, and Z. G. Liu, J. Phys. D: Appl. Phys. 36, 389 (2003).
  8. M. S. R. Rao, C. P. D'Souza, P. R. Apte, R. Pinto, L. C. Gupta, S. Srinivas, and A. K. Bhatnagar, J. Appl. Phys. 79, 940 (1996).
  9. R. Radhakrishnan, A. V. Virkar, S. C. Singhal, G. C. Dunham, and O. A. Marina, Sens. Actuators B 105, 312 (2005).
  10. A. Bieberle-Hütter, D. Beckel, A. Infortuna, U. P. Muecke, J. L. M. Rupp, L. J. Gauckler, S. Rey-Mermet, P. Muralt, N. R. Bieri, N. Hotz, M. J. Stutz, D. Poulikakos, P. Heeb, P. Müller, A. Bernard, R. Gmür, and T. Hocker, J. Power Sources 177, 123 (2008).
  11. C. Brahim, A. Ringuede, M. Cassir, M. Putkonen, and L. Niinisto, Appl. Surf. Sci. 253, 3962 (2007).
  12. H. M. Christen and G. Eres, J. Phys.: Condens. Matter 20, 16 (2008).
  13. N. Pryds, B. Toftmann, J. B. Bilde-Sorensen, J. Schou, and S. Linderoth, Appl. Surf. Sci. 252, 4882 (2006).
  14. D. B. Chrisey and G. K. Hubler, Pulsed Laser Deposition of Thin Films (Wiley, New York, 1994).
  15. B. Holzapfel, B. Roas, L. Schultz, P. Bauer, and G. Saemannischenko, Appl. Phys. Lett. 61, 3178 (1992).
  16. K. Kinoshita, H. Ishibashi, and T. Kobayashi, Jpn. J. Appl. Phys. Part 2 33, L417 (1994).
  17. A. Marcu, C. Grigoriu, W. H. Jiang, and K. Yatsui, Thin Solid Films 360, 166 (2000).
  18. T. Kobayashi, H. Akiyoshi, and M. Tachiki, Appl. Surf. Sci. 197–198, 294 (2002).
  19. E. V. Pechen, A. V. Varlashkin, S. I. Krasnosvobodtsev, B. Brunner, and K. F. Renk, Appl. Phys. Lett. 66, 2292 (1995).
  20. P. Caminat, E. Valerio, M. Autric, C. Grigorescu, and O. Monnereau, Thin Solid Films 453–454, 269 (2004).
  21. S. J. Henley, G. M. Fuge, and M. N. R. Ashfold, J. Appl. Phys. 97, 023304 (2005).
  22. M. Murakami, B. Liu, Z. D. Hu, Z. L. Liu, Y. Uehara, and Y. Che, Appl. Phys. Express 2, 042501 (2009).
  23. J. Ihlemann, A. Scholl, H. Schmidt, and B. Wolff-Rottke, Appl. Phys. A: Mater. Sci. Process. 60, 411 (1995).
  24. F. Sánchez, F. Benitez, and M. Varela, Vacuum 65, 115 (2002).
  25. P. Li, D. Lim, and J. Mazumder, J. Appl. Phys. 92, 666 (2002).
  26. F. Sanchez, R. Aguiar, P. Serra, M. Varela, and J. L. Morenza, Thin Solid Films 317, 108 (1998).
  27. A. A. Voevodin, J. G. Jones, and J. S. Zabinski, J. Appl. Phys. 88, 1088 (2000).
  28. J. Koch, M. Walle, J. Pisonero, and D. Gunther, J. Anal. At. Spectrom. 21, 932 (2006).
  29. M. Hauer, D. J. Funk, T. Lippert, and A. Wokaun, Opt. Lasers Eng. 43, 545 (2005).
  30. J. Koch, S. Schlamp, T. Rosgen, D. Fliegel, and D. Gunther, Spectrochim. Acta, Part B 62, 20 (2007).
  31. T. Lippert and J. T. Dickinson, Chem. Rev. (Washington, D.C.) 103, 453 (2003).
  32. A. Vogel and V. Venugopalan, Chem. Rev. (Washington, D.C.) 103, 577 (2003).
  33. S. Zoppel, D. Gray, M. Farsari, R. Merz, G. A. Reider, and C. Fotakis, J. Phys.: Conf. Ser. 59, 610 (2007).
  34. J. Ihlemann and B. Wolff-Rottke, Appl. Surf. Sci. 106, 282 (1996).
  35. E. Matthias and Z. L. Wu, Appl. Phys. A: Mater. Sci. Process. 56, 95 (1993).
  36. V. R. PaiVerneker, A. N. Petelin, F. J. Crowne, and D. C. Nagle, Phys. Rev. B 40, 8555 (1989).
  37. J. M. Costantini, F. Beuneu, D. Gourier, C. Trautmann, G. Calas, and M. Toulemonde, J. Phys.: Condens. Matter 16, 3957 (2004).
  38. P. Rudolph, J. Bonse, J. Kruger, and W. Kautek, Appl. Phys. A: Mater. Sci. Process. 69, S763 (1999).
  39. S. Küper and M. Stuke, Appl. Phys. A: Mater. Sci. Process. 49, 211 (1989).
  40. S. H. Jeong, R. Greif, and R. E. Russo, Appl. Surf. Sci. 127–129, 1029 (1998).
  41. L. S. Bennett, T. Lippert, H. Furutani, H. Fukumura, and H. Masuhara, Appl. Phys. A: Mater. Sci. Process. 63, 327 (1996).
  42. S. H. Jeong, R. Greif, and R. E. Russo, J. Phys. D: Appl. Phys. 32, 2578 (1999).
  43. Y. B. Zel'dovich and Y. P. Raizer, Physics of Shock Waves and High-Temperature Hydrodynamic Phenomena (Dover, Mineola, NY, 2002).
  44. B. N. Chichkov, C. Momma, S. Nolte, F. von Alvensleben, and A. Tunnermann, Appl. Phys. A: Mater. Sci. Process. 63, 109 (1996).
  45. M. D. Perry, B. C. Stuart, P. S. Banks, M. D. Feit, V. Yanovsky, and A. M. Rubenchik, J. Appl. Phys. 85, 6803 (1999).
  46. R. H. J. Hannink, P. M. Kelly, and B. C. Muddle, J. Am. Ceram. Soc. 83, 461 (2000).
  47. E. Fernández López, V. Sánchez Escribano, M. Panizza, M. M. Carnasciali, and G. Busca, J. Mater. Chem. 11, 1891 (2001).
  48. C. H. Perry, F. Lu, D. W. Liu, and B. Alzyab, J. Raman Spectrosc. 21, 577 (1990).
  49. S. Heiroth, T. Lippert, A. Wokaun, M. Döbeli, J. L. M. Rupp, B. Scherrer, and L. J. Gauckler, J. Eur. Ceram. Soc. 30, 489 (2010).
  50. T. E. Itina, K. Gouriet, L. V. Zhigilei, S. Noel, J. Hermann, and M. Sentis, Appl. Surf. Sci. 253, 7656 (2007).
  51. M. Guillermin, C. Liebig, F. Garrelie, R. Stoian, A. S. Loir, and E. Audouard, Appl. Surf. Sci. 255, 5163 (2009).

CITING ARTICLES
For access to citing articles, you need to log in.
For access to citing articles, you need to Log in.
ADVERTISEMENT