Home | About Journal | Web Links | E-mail Alerts | RSS RSS Icon | Browse
Previous Article Next Article

Monolithic double-grating phase mask for large-period highly coherent grating printing

Source: Opt. Lett. 34, 3800 (2010); doi:10.1364/OL.34.003800

Published 2009-11-09

KEYWORDS and PACS
Keywords
PACS
  • 42.79.Dj
    Gratings
  • 42.82.Cr
    Optical fabrication techniques; lithography, pattern transfer (integrated optics)
  • YEAR: 2010
PUBLICATION DATA
ISSN:
1553-9601 (online)
Publisher:
AIP is a member of CrossRef OSA
Y. Bourgin,1,2 S. Bakkali,1,2 Y. Jourlin,1,2 S. Tonchev,1,2,3 and O. Parriaux1,2
1Université de Lyon, F-42023 Saint-Etienne, France
2CNRS, UMR 5516, Laboratoire Hubert Curien, F-42000 Saint-Etienne, France
3On leave from the Institute of Solid State Physics, Sofia, Bulgaria
A monolithic double-grating phase mask comprising three short-pitch grating sections of spatial frequencies k1 and k2 collocated at one side of a substrate produces a large-period interferogram without higher harmonics to print in a photoresist film a latent grating of small spatial frequency equal to twice k2−k1. When incorporated in a write-on-the-fly scheme, the elements permit the fabrication of unlimitedly long gratings. ©2009 Optical Society of America

(As supplied by publisher.)

History: Received 4 September 2009; revised 3 November 2009; accepted 4 November 2009; published 2009-11-09
Permalink: http://dx.doi.org/10.1364/OL.34.003800

There are no references.

ADVERTISEMENT