ION IMPLANTATION TECHNOLOGY 2010: 18th International Conference on Ion Implantation Technology IIT 2010

Ion Implantation Technology 2010

Jiro Matsuo, Kyoto University, Quantum Science and Engineering Center, Japan ; Masataka Kase, Fujitsu Semiconductor Limited, Device Development Division, Japan ; Takaaki Aoki, Kyoto University, Graduate School of Engineering, Department of Electronic Science and Engineering, Japan ; Toshio Seki, Kyoto University, Graduate School of Engineering, Department of Electronic Science and Engineering, Japan

Conference Location and Date: Kyoto, Japan, 6-11 June 2010

Subseries: Materials Physics and Applications

Published ; ISBN 978-0-7354-0876-0, One Volume Print, CD-ROM included; 532 pages; 8.5 X 11 inches, double column; Hardcover; $329.00

Readership: Scientists and Engineers working in the field of LSI fabrication, material science for nano-technology. Academic and industrial researchers in accelerator, solid-state (diffusion) physics and nanomanufacturing

The proceedings of 18th International conference on Ion Implantation Technology (IIT2010) covers all aspect of ion implantation, from the fundamentals of ion-solid interactions to industrial applications of the latest implantation machines and device manufacturing.

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