ION IMPLANTATION TECHNOLOGY: 16th International Conference on Ion Implantation Technology; IIT 2006

16th International Conference on Ion Implantation Technology

Karen J. Kirkby, Advanced Technology Institute, Surrey Ion Beam Centre, Guildford, Surrey, United Kingdom ; Russell M. Gwilliam, Advanced Technology Institute, Surrey Ion Beam Centre, Guildford, Surrey, United Kingdom ; Andy Smith, Advanced Technology Institute, Surrey Ion Beam Centre, Guildford, Surrey, United Kingdom ; David Chivers, Ion Links Int. Ltd., West Lothian, Scotland

Conference Location and Date: Marseille, France, 11-16 June 2006

Subseries: Accelerators and Beams

Published November 2006; ISBN 978-0-7354-0365-9, One Volume, Print; 682 pages; 8.5 X 11 inches, double column; Hardcover; $217.00
CD-ROM VERSION (sold separately): ISBN 978-0-7354-0366-6; $145.00
ISBN: 978-0-7354-0366-6, CD-ROM (sold separately) 145

Readership: Researchers in ion implantation technology (industry and academia); developers of ion implantation technology (industry); semiconductor chip manufacturers (industry); researchers in material modification by ion implantation (academia).

All papers were peer-reviewed. Ion implantation is used to manufacture semiconductor devices. Materials properties are changed by bombarding wafers with atoms, which are accelerated in an ion implanter. This is the premier world conference for the presentation of the latest advances in ion implantation, from the fundamentals of ion-solid interactions to manufacturing implant equipment. Topics included are: doping processes in semiconductors; plasma immersion ion implantation and plasma doping; materials - novel techniques and applications; implant technology; process control and yield; metrology; as well as machines.

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