http://scitation.aip.org/ Electrochemical Society Letters: Electrochemical Synthesis and Engineering - Current Issue http://link.aip.org/link/?ESL/12/E23/1&agg=rss Dong Lim Kim, Sang Hoon Pak, Si Joon Kim, Seong-Kee Park, and Hyun Jae Kim<br/> Cyclopentasilane, which has a chemical shift at 3.7 ppm as revealed by H NMR, was used as a precursor for solution-processed Si films after photopolymerization. X-ray photoelectron spectroscopy revealed a Si 2p peak at 99.68 eV, showing a binding energy shift of about 0.3 eV due to a decrease in hyd ... [Electrochem. Solid-State Lett. 12, E23 (2009)] published Mon Aug 17, 2009.